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01Optical Thin Films
Structures made of multiple layers of thin materials that control the reflection, transmission, and absorption of light via E-B Chamber as well as Sputtering Chamber under 1000 Class clean room.
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02Reactive lon-Etching
Uses chemical reactions in a plasma state to finely process the surface of substrates under 100 Class Clean Room. This process allows precise etching of fine structures in semiconductor manufacturing.
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03Nano Imprinting Technology
It transfers precise patterns at the nanometer scale onto various substrates. This method enables the rapid creation of high-resolution nanostructures.
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04Photolithography
The key step in semiconductor manufacturing enabling the miniaturization and high integration of integrated circuits under 10 Class Clean Room.
